发明名称 |
PATTERN FORMING METHOD, ELECTRON BEAM-SENSITIVE OR EXTREME ULTRAVIOLET RAY-SENSITIVE RESIN COMPOSITION, RESIST FILM, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE USING THE SAME |
摘要 |
There is provided a pattern forming method, including: (a) forming a film by using an electron beam-sensitive or extreme ultraviolet ray-sensitive resin composition containing a resin (A) having a repeating unit represented by Formula (1-0) and a repeating unit represented by Formula (1-2); (b) exposing the film by using an electron beam or extreme ultraviolet ray; and (c) developing the exposed film by using a developer containing an organic solvent to form a negative pattern, wherein a content of the repeating unit represented by Formula (1-0) is 45 mol% or more based on a whole repeating units in the resin (A). |
申请公布号 |
WO2014030723(A1) |
申请公布日期 |
2014.02.27 |
申请号 |
WO2013JP72485 |
申请日期 |
2013.08.16 |
申请人 |
FUJIFILM CORPORATION |
发明人 |
TAKIZAWA, HIROO;HIRANO, SHUJI;YOKOKAWA, NATSUMI;NIHASHI, WATARU |
分类号 |
G03F7/038;C08F220/12;G03F7/004;G03F7/039;G03F7/32;H01L21/027 |
主分类号 |
G03F7/038 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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