发明名称 WAFER SUPPORT DEVICE
摘要 A wafer support device is provided. The wafer support device includes a plurality of support portions; and a bottom area located among the support portions, wherein the bottom area has a protective layer formed thereon. A method for processing a working surface of a wafer support device is also provided.
申请公布号 US2014057052(A1) 申请公布日期 2014.02.27
申请号 US201213593479 申请日期 2012.08.23
申请人 CHENG TIEN-CHIH;ZHANG YING;SUEN SHU-HUEI;KAO CHEN-CHIAO;TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. 发明人 CHENG TIEN-CHIH;ZHANG YING;SUEN SHU-HUEI;KAO CHEN-CHIAO
分类号 B05C13/00;B05C11/00;B05D1/02;B05D3/12;B23B31/28 主分类号 B05C13/00
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