Fe-Co BASED ALLOY SPUTTERING TARGET MATERIAL, METHOD FOR PRODUCING THE SAME, SOFT MAGNETIC THIN FILM LAYER, AND VERTICAL MAGNETIC RECORDING MEDIUM USING THE SAME

摘要

PROBLEM TO BE SOLVED: To provide an Fe-Co based alloy sputtering target material not cracked during sputtering.SOLUTION: Disclosed is a sputtering target material satisfying 0≤X≤100, 4≤Y≤28 by atomic ratio in the formula (1) of an Fe-Co-M based alloy, the microstructure of the sputtering target material comprises a phase essentially consisting of Fe and Co and an intermetallic compound phase consisting of one or two kinds of Fe and Co and an M element(s), and in which the area of an eutectic structure occupying in the whole of the microstructure is 30% or less: (Fe-Co)M(1).