CONVEYING APPARATUS, EXPOSURE APPARATUS, EXPOSURE METHOD, FLAT PANEL DISPLAY MANUFACTURING METHOD, AND DEVICE MANUFACTURING METHOD

摘要

PROBLEM TO BE SOLVED: To miniaturize an exposure apparatus.SOLUTION: An exposure operation includes: transferring a mask pattern to a first area (first and second shot areas SA1 and SA2) of a substrate P by using an energy beam; turning the substrate P around a Z axis with respect to a substrate holder 30; transferring a mask pattern to a second area (third and fourth shot areas SA3 and SA4) of the substrate P by using an energy beam; moving the substrate P relative to the substrate holder 30 in an X-axis direction; and transferring a mask pattern to a third region (fifth and sixth shot areas SA5 and SA6) of the substrate P by using an energy beam.