发明名称 |
METHOD FOR MANUFACTURING DEVICE |
摘要 |
A method for manufacturing a device having a concavo-convex structure includes forming an organic resist film on an n-type semiconductor layer in which a fine concavo-convex structure is to be formed; forming a silicon-containing resist film on the organic resist film; patterning the silicon-containing resist film by nanoimprint; oxidizing the silicon-containing resist film with oxygen-containing plasma to form a silicon oxide film; dry-etching the organic resist film by using the silicon oxide film as an etching mask; dry-etching the n-type semiconductor layer by using the silicon oxide film and the organic resist film as an etching masks; and removing the silicon oxide film and the organic resist film. |
申请公布号 |
US2014057377(A1) |
申请公布日期 |
2014.02.27 |
申请号 |
US201314115073 |
申请日期 |
2013.02.18 |
申请人 |
ULVAC, INC.;TOSHIBA KIKAI KABUSHIKI KAISHA;MARUBUN CORPORATION |
发明人 |
KAMIMURA RYUICHIRO;OSADA YAMATO;KASHIMA YUKIO;NISHIHARA HIROMI;TASHIRO TAKAHARU;OOKAWA TAKAFUMI |
分类号 |
H01L33/22 |
主分类号 |
H01L33/22 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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