| 摘要 |
A plasma-generating apparatus includes a first electrode of which at least a part is positioned within a treatment vessel that is to contain liquid, a second electrode of which at least a part is positioned within the treatment vessel, a bubble-generating part which generate a bubble when the liquid is contained in the treatment vessel, such that a surface where conductor is exposed, of a surface of the first electrode which surface is positioned within the treatment vessel, is positioned within the bubble, a gas-supplying apparatus, a power supply for applying voltage between the first electrode and the second electrode. |
