| 摘要 |
PROBLEM TO BE SOLVED: To prevent the pattern collapse in a cleaning step of a metal-based wafer with concave and convex patterns formed on a surface thereof.SOLUTION: A chemical solution comprises a water-repellent protection-film-forming agent expressed by the following general formula [1]. The chemical solution is used in a surface treatment before a drying step after a cleaning step of a metal-based wafer. (In the formula [1], Ris a monovalent hydrocarbon group with 1-18 carbon atoms in which a fluorine element may be partially or totally substituted for a hydrogen element; Ris a monovalent organic group including a hydrocarbon group with 1-18 carbon atoms in which a fluorine element may be partially or totally substituted for a hydrogen element in a mutual independent manner; and "a" is an integer of 0-2.) |
