MANUFACTURING METHOD OF OPTICAL SEMICONDUCTOR ELEMENT

摘要

PROBLEM TO BE SOLVED: To provide a manufacturing method of an optical semiconductor element including electrodes that are provided in openings having different depths to each other.SOLUTION: The manufacturing method of an optical semiconductor element includes: a first step S10 of preparing a substrate product 31 including semiconductor mesas 13A, 13B; a second step S20 of forming an embedded layer 18; a third step S30 of forming a first opening 19; a fourth step S50 of forming a second opening 21; a fifth step S70 of exposing a semiconductor layer 12; and a sixth step S80 of forming first electrodes 5a, 6a and a second electrode 7a. The fourth step S50 performs a second etching step at least once after performing a first etching step.