发明名称 EXPOSURE APPARATUS AND METHOD OF MANUFACTURING ARTICLE
摘要 An exposure apparatus includes an optical system configured to expose a substrate. The optical system includes an optical member, a holding portion which holds the optical member, a pressing portion which presses the holding portion and the optical member against each other, and a sealed adhesive material which is filled in a space formed by the optical member and the holding portion pressed against each other, and adheres the optical member and the holding portion to each other.
申请公布号 US2014055766(A1) 申请公布日期 2014.02.27
申请号 US201313966512 申请日期 2013.08.14
申请人 CANON KABUSHIKI KAISHA 发明人 MOCHIZUKI SHINYA;MAEHARA YUJI
分类号 G03F7/20 主分类号 G03F7/20
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