| 摘要 |
PROBLEM TO BE SOLVED: To provide a production method of a resist pattern with high resolution.SOLUTION: A resist composition is provided, which comprises a resin including a structural unit expressed by formula (I), a resin including a structural unit having an acid-labile group and including no structural unit expressed by formula (I), and an acid generator expressed by formula (II). In the formulae, Rrepresents a hydrogen atom or a methyl group; Rrepresents a saturated hydrocarbon group having a fluorine atom; Xis an alkanediyl group, in which a hydrogen atom included in the group can be replaced by a hydroxy group or -OR, and -CH- constituting the group can be replaced by -O- or -CO-; Rand Reach independently represent a hydrocarbon group, in which a hydrogen atom included in the group can be replaced by a fluorine atom or a hydroxy group, and -CH- constituting the group can be replaced by -O- or -CO-; and Zrepresents an organic cation. |
