发明名称 SEMICONDUCTOR DEVICE AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD
摘要 PROBLEM TO BE SOLVED: To inhibit the occurrence of substrate current in a Dt (Dynamic threshold) MOS transistor.SOLUTION: When a MOS transistor 10 in which a gate electrode 15 and a body region 13 are short-circuited is formed, pn junction (junction between n-type region 17, p-type region 18) having reverse polarity to pn junction between a source/drain region 14 and the body region 13 or an insulator 19 is formed between a bottom part of the source/drain region of the MOS transistor 10 and the body region 13, and an insulator 19 is formed between at least a part of a side wall of the source/drain region 14 and the body region 13.
申请公布号 JP2014038956(A) 申请公布日期 2014.02.27
申请号 JP20120180993 申请日期 2012.08.17
申请人 FUJITSU SEMICONDUCTOR LTD 发明人 MIMURA TOKUJI
分类号 H01L21/336;H01L21/8238;H01L27/092;H01L29/78 主分类号 H01L21/336
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