| 摘要 |
PROBLEM TO BE SOLVED: To provide a polishing liquid composition for a sapphire substrate which makes possible to prepare a sapphire substrate with good surface roughness on a face to be polished at a high polishing speed, and to provide a polishing method of a sapphire substrate by use of the polishing liquid composition.SOLUTION: A polishing liquid composition for a sapphire substrate is used in polishing a sapphire substrate, and comprises: an alkanolamine compound; silica particles; and water. The hydrogen ion density index (pH) of the polishing liquid composition is in a range of 9.5 to 11.5 (exclusive of 11.5). The polishing liquid composition further comprises, as an alkaline component for controlling the pH in the range of 9.5 to 11.5 (exclusive 11.5), at least one compound selected from a group consisting of inorganic alkali compounds, and organic amines. Polishing a sapphire substrate by use of the polishing liquid composition for a sapphire substrate, the polishing speed can be increased, and the surface roughness of a face to be polished can be reduced. |
