发明名称 CONTINUOUS PATTERN PLATING TRANSFER SYSTEM, AND METHOD FOR MANUFACTURING CONTINUOUS PATTERN PLATING TRANSFER MATERIAL
摘要 PROBLEM TO BE SOLVED: To provide a continuous pattern plating transfer system and a method for manufacturing a continuous pattern plating transfer material, in which patterning is performed only by plating and etching is unnecessary.SOLUTION: A continuous pattern plating transfer system includes: a plating unit including at least one plating tank accommodating a plating liquid; at least one DLC (Diamond like Carbon) pattern cylinder body that is immersed in the plating liquid of the plating tank, in which a pattern plating layer is formed on a surface of the same, and that is turnably disposed; and at least one printing base material-turning means that includes a printing base material continuously transported on a surface of the DLC pattern cylinder body and a pressure transfer roller that performs pressure transfer of the pattern plating layer to at least one surface of the printing base material from a surface of the DLC pattern cylinder body, wherein the pattern plating layer is subjected to pressure transfer onto at least one part of the printing base material by the pressure transfer roller, thereby the pattern plating layer is continuously transferred.
申请公布号 JP2014037615(A) 申请公布日期 2014.02.27
申请号 JP20120248482 申请日期 2012.11.12
申请人 THINK LABORATORY CO LTD 发明人 SHIGETA TATSUO
分类号 C25D1/00;C25D1/10;H05K3/18;H05K3/20 主分类号 C25D1/00
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