| 摘要 |
PROBLEM TO BE SOLVED: To reduce a time period required for a seasoning process when a silicon compound is deposited in a remote plasma-induced CVD method to improve productivity.SOLUTION: In a seasoning process of a remote plasma-induced CVD method in which a vacuum vessel is separated into a plasma generation space and a substrate processing space with a partition wall, while in general a material gas is flowed in the plasma generation space and a silicon containing gas is flowed in the substrate processing space, by flowing in both material gas and silicon containing gas into the plasma generation space, a time period required for the seasoning process can be significantly reduced. |
