发明名称 Apparatus and Method for Multiple Gate Transistors
摘要 An apparatus comprises a substrate having a first crystal orientation and an active region, wherein an upper portion of the active region is of a second crystal orientation and the upper portion of the active region is wrapped by a gate structure around two sides. The apparatus further comprises a trench surrounded by isolation regions, wherein the upper portion of the active region is over top surfaces of the isolation regions.
申请公布号 US2014054646(A1) 申请公布日期 2014.02.27
申请号 US201213594579 申请日期 2012.08.24
申请人 VELLIANITIS GEORGIOS;TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. 发明人 VELLIANITIS GEORGIOS
分类号 H01L29/78;H01L21/20 主分类号 H01L29/78
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