发明名称 Systems and Methods for Depositing and Charging Solar Cell Layers
摘要 Systems and methods of the present invention may be used to charge a layer (such as a passivation layer and/or antireflective layer) of a solar cell (e.g., wafer) with a positive or negative charge. The layer may retain the charge to improve operation of the solar cell. The charged layer may include any suitable dielectric material capable of retaining either a negative or a positive charge. Systems and methods of the present invention permit in-situ charging of a layer. Charging of a layer may be accomplished during or after deposition of the layer including after completing the whole solar cell process, in other words, on a finished cell.
申请公布号 US2014057386(A1) 申请公布日期 2014.02.27
申请号 US201313954099 申请日期 2013.07.30
申请人 AMTECH SYSTEMS, INC. 发明人 HWANG JEONG-MO
分类号 H01L31/18 主分类号 H01L31/18
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