METHOD AND DEVICE FOR LIGHT-INDUCED OR LIGHT-SUPPORTED DEPOSITING OF METAL ON A SURFACE OF A SEMICONDUCTOR COMPONENT

摘要

The invention relates to a method for light entrapment in coating baths, in order thereby to deposit metal on a surface of a semiconductor component in a light-induced or light-supported manner. The method comprises at least the following steps: A) providing the coating bath which contains a matrix and a radiation deflecting component or is made of same; B) introducing the at least one semiconductor component into the coating bath; C) carrying out the light-induced or light-supported deposition.