| 发明名称 |
SPUTTER TARGETS AND METHODS OF FORMING SAME BY ROTARY AXIAL FORGING |
| 摘要 |
A method of making sputter targets using rotary axial forging is described. Other thermomechanical working steps can be used prior to and/or after the forging step. Sputter targets are further described which can have unique grain size and/or crystal structures. |
| 申请公布号 |
KR101368057(B1) |
申请公布日期 |
2014.02.26 |
| 申请号 |
KR20127023065 |
申请日期 |
2005.05.06 |
| 申请人 |
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发明人 |
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| 分类号 |
C22C14/00;C22C16/00;C22C27/02;C22F1/08;C22F1/16;C22F1/18;C23C14/34 |
主分类号 |
C22C14/00 |
| 代理机构 |
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代理人 |
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