发明名称 Article holder for a lithographic apparatus
摘要 A lithographic projection apparatus comprising: a radiation system for providing a projection beam of radiation; an article holder comprising a plurality of protrusions defining a protrusion configuration arranged to provide a flat plane of support for supporting a substantially flat article to be placed in a beam path of said projection beam of radiation, the article holder comprising at least one clamping electrode for generating an electrostatic clamping force, for clamping an article against the article holder. According to the invention, said at least one clamping electrode comprises an electric field changing structure for locally changing said electrostatic clamping force for leveling local height variations of said substrate.
申请公布号 EP1500984(B1) 申请公布日期 2014.02.26
申请号 EP20040077003 申请日期 2004.07.09
申请人 ASML NETHERLANDS B.V. 发明人 ZAAL, KOEN JACOBUS JOHANNES MARIA;OTTENS, JOOST JEROEN;VAN EMPEL, TJARKO ADRIAAN RUDOLF;HOPMAN, JAN
分类号 G03F7/20 主分类号 G03F7/20
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