发明名称 |
ATOMIC LAYER DEPOSITION CAROUSEL WITH CONTINUOUS ROTATION AND METHODS OF USE |
摘要 |
Provided are atomic layer deposition apparatus and methods including a rotating wheel with a plurality of substrate carriers for continuous processing of substrates. The processing chamber may have a loading station on the front end which is configured with one or more robots to load and unload substrates from the substrate carriers without needing to stop the rotating wheel. |
申请公布号 |
KR20140023291(A) |
申请公布日期 |
2014.02.26 |
申请号 |
KR20137025397 |
申请日期 |
2012.03.01 |
申请人 |
APPLIED MATERIALS, INC. |
发明人 |
YUDOVSKY JOSEPH |
分类号 |
C23C16/44;C23C16/455;C23C16/458;H01L21/205 |
主分类号 |
C23C16/44 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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