| 摘要 |
The present invention relates to a rotatable gas spraying apparatus for spraying a gas for depositing a thin film on the surface of a substrate moving in a first direction. The rotatable gas spraying apparatus according to the present invention, a first rotation spraying module that is extended in a second direction vertical to the first direction, rotates in the second direction, and selectively sprays a first process gas and a purge gas; a second rotation spraying module that faces the first rotation spraying module in the first direction, rotates in the second direction, and selectively sprays a second process gas and the purge gas; and a nozzle rotation driving part that rotates the first rotation spraying module and second rotation spraying module to block the gas injection of the second rotation spraying module when the first rotation spraying module sprays the first process gas. Therefore, the deposition thickness of the thin film is controlled according to the number of rotation of the first rotation spraying module and the second rotation spraying module without the increase of separate equipment or the reciprocation of the substrate. Also, throughput is improved, the size of a gas spraying structure becomes smaller, and the structure is simplified. [Reference numerals] (340) Nozzle rotation driving part |
