| 摘要 |
<p>An exposure device according to the present invention transmits exposure light from a light source through a mask wherein a plurality of patterns to be exposed are provided at a given distance in a direction orthogonal to a scanning direction, and provides an upright equal-size image of the patterns on a substrate by means of a plurality of microlenses in a microlens array. The mircolens array is constituted by microlens array chips which are connected in a second direction, and openings for transmitting the exposure light are provided in a frame shaped holder for supporting the microlens array chips, such that the openings are positioned to match the positions between the microlens array chips. Hereby, it is possible to expose a substrate on which a positive resist material is formed across regions that will become a plurality of individual substrates.</p> |
