VAPOR-DEPOSITION DEVICE, VAPOR-DEPOSITION METHOD, ORGANIC EL DISPLAY, AND LIGHTING DEVICE

摘要

A deposition method includes moving a substrate in a first direction within a processing chamber; generating a first source gas by evaporating a first film forming source material; discharging the first source gas from a first discharge opening toward the substrate being moved in the processing chamber; forming a first line-shaped thin film elongated in the first direction by depositing the first source gas on the substrate; generating a second source gas by evaporating a second film forming source material; discharging the second source gas from a second discharge opening offset from the first discharge opening in a second direction, which intersects the first direction, toward the substrate being moved in the processing chamber; and forming a second line-shaped thin film elongated in the first direction by depositing the second source gas on the substrate at a position spaced apart from the first line-shaped thin film.