发明名称 Probe card and semiconductor wafer inspection method using the same
摘要 A probe card has a thin film substrate having projection electrodes on a first surface facing the semiconductor wafer and at a position facing the pad electrodes, a non-contact electrode, and first electrodes provided a second surface opposite to the first surface; and a wiring substrate having second electrodes disposed at a side opposite to the semiconductor wafer in the thin film substrate and at a position facing the first electrodes. The wiring substrate and the thin film substrate form a first sealed space and the thin film substrate and the semiconductor wafer form a second sealed space. By reducing the pressure in the first and the second sealed space, the first and the second electrodes are brought into close contact with each other and the pad electrodes and the projection electrodes are brought into close contact with each other, and the pressure of each of the first and second sealed space can be independently adjusted.
申请公布号 US8659312(B2) 申请公布日期 2014.02.25
申请号 US20100838849 申请日期 2010.07.19
申请人 NAKATA YOSHIROU;MIYAKE NAOMI;PANASONIC CORPORATION 发明人 NAKATA YOSHIROU;MIYAKE NAOMI
分类号 G01R31/20;G01R31/302;G01R31/312 主分类号 G01R31/20
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