发明名称 |
Apparatus and method for controlled particle beam manufacturing |
摘要 |
A chamber for exposing a workpiece to charged particles includes a charged particle source for generating a stream of charged particles, a collimator configured to collimate and direct the stream of charged particles from the charged particle source along an axis, a beam digitizer downstream of the collimator configured to create a digital beam including groups of at least one charged particle by adjusting longitudinal spacing between the charged particles along the axis, a deflector downstream of the beam digitizer including a series of deflection stages disposed longitudinally along the axis to deflect the digital beams, and a workpiece stage downstream of the deflector configured to hold the workpiece. |
申请公布号 |
US8658994(B2) |
申请公布日期 |
2014.02.25 |
申请号 |
US201213354938 |
申请日期 |
2012.01.20 |
申请人 |
ZANI MICHAEL JOHN;BENNAHMIAS MARK JOSEPH;SCOTT JEFFREY WINFIELD;NEXGEN SEMI HOLDING, INC. |
发明人 |
ZANI MICHAEL JOHN;BENNAHMIAS MARK JOSEPH;SCOTT JEFFREY WINFIELD |
分类号 |
H01L21/265;G21K5/10;H01L21/425;H01L29/06 |
主分类号 |
H01L21/265 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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