发明名称 NITRIDING PRODUCT AND METHOD FOR NITRIDING BY PLASMA
摘要 The present invention relates to a nitrified product and a nitriding method by using plasma for replacing a nitiridation process of a bushing product with a nitridation process and a sulphurizing nitridation process processed in a clean plasma environment comprising: a pre-heating step for heating a specimen by charging the specimen to an inside of a furnace, and raising the temperature inside a furnace to a pre-heating process temperature in a vacuum atmosphere; a sputtering step for maintaining the pressure inside the furnace to a sputtering process pressure, and for ion etching a surface of the specimen while inserting Ar and H2 into an inside of the furnace; a soft nitriding step for maintaining pressure inside the furnace to a soft nitriding process pressure, and for inserting N2, H2, and carbon gas, and for forming a compound layer and a hardened layer on a surface of the specimen while applying a current to a screen net equipped in the specimen and an outside of the specimen; a sulfnitriding step for forming a sulfnitriding layer above a compound layer by inserting H2S after lowering the temperature inside a furnace to a sulfnitriding process temperature; and a cooling step for cooling the specimen by inserting N2 into an inside of a furnace. According to the configuration, a process can be simplified; work expenses can be saved through an environment-friendly process; whole product manufacturing costs can be reduced by replacing an expensive MoS2 process; and a problem of a post-process which is processed after salt bath nitriding can be solved by minimizing deformation after a plasma process. [Reference numerals] (AA) Sulfnitriding layer; (BB) Compound layer; (CC) Hardened layer; (DD) Specimen
申请公布号 KR20140022526(A) 申请公布日期 2014.02.25
申请号 KR20120088613 申请日期 2012.08.13
申请人 KOREA INSTITUTE OF INDUSTRIAL TECHNOLOGY 发明人 PARK, HYUN JUN;MOON, KYOUNG IL;BYUN, CHEOL WOONG;KIM, HYUNG JUN;LEE, SEUNG WOO
分类号 C23C8/24;C23C16/50 主分类号 C23C8/24
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