发明名称 METHOD FOR EVALUATING NITROGEN CONCENTRATION IN SILICON SINGLE CRYSTAL
摘要 PROBLEM TO BE SOLVED: To provide a method for simply obtaining nitrogen concentration in a CZ silicon single crystal when oxygen concentration is low.SOLUTION: In a method for evaluating nitrogen concentration in a nitrogen-doped silicon simple crystal created in the Czochralski method, when the silicon simple crystal is created, a silicon simple crystal having a low oxygen concentration region with an oxygen concentration of 6.0×10atoms/cmor less is created, a peak derived from a NN pair is detected by an infrared absorption spectroscopic method relative to the silicon simple crystal in the low oxygen concentration region, and nitrogen concentration is evaluated on the basis of the detection result.
申请公布号 JP2014035305(A) 申请公布日期 2014.02.24
申请号 JP20120177667 申请日期 2012.08.10
申请人 SHIN ETSU HANDOTAI CO LTD 发明人 KAMATA HIROYUKI;HOSHI RYOJI
分类号 G01N21/35;C30B29/06 主分类号 G01N21/35
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