PLASMA PROCESSING APPARATUS, AND MICROWAVE OUTPUT DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a plasma processing apparatus and a microwave output device capable of stabilizing a microwave output with high accuracy and improving an accuracy of processing.SOLUTION: A plasma processing apparatus comprises: a high-voltage power supply for supplying a high-voltage power to a magnetron; and a detector for detecting a microwave output from the magnetron. The output of the high-voltage power supply is adjusted on the basis of a result of comparison between a signal obtained by adding an output from the detector to an AC component of a current detected from an output of the high-voltage power supply, and a setting value for the output of the high-voltage power supply.