| 摘要 |
PROBLEM TO BE SOLVED: To provide a light source device for peripheral exposure in which the width of undercut can be reduced at an edge of a resist film, when removing an unnecessary part of the resist film by performing peripheral exposure.SOLUTION: A light source for peripheral exposure 10 used when performing peripheral exposure of the vicinity of outer peripheral region of exposed objects 1, 1a includes: a discharge lamp 11 emitting light; an ellipse collector mirror 13 reflecting the light emitted from the discharge lamp 11; a light guide 16 for guiding the light reflected on the ellipse collector mirror 13 to the exposed objects 1, 1a; and an oblique light component regulation part 17 for regulating irradiation of an oblique light component which will impinge on the exposed objects 1, 1a with an inclination exceeding a predetermined angle, and irradiating other light components toward the exposed objects 1, 1a. |
