发明名称 |
SAPPHIRE SUBSTRATE FOR GROWING GALLIUM NITRIDE CRYSTAL, MANUFACTURING METHOD OF GALLIUM NITRIDE CRYSTAL, AND GALLIUM NITRIDE CRYSTAL |
摘要 |
PROBLEM TO BE SOLVED: To provide a sapphire substrate for growing gallium nitride crystals that achieves lower dislocation of gallium nitride crystals and higher quality of the gallium nitride crystals compared with a conventional one, a manufacturing method of gallium nitride crystals, and the gallium nitride crystals.SOLUTION: A sapphire substrate 10 for growing gallium nitride crystals has a plurality of tiny saliences 12 formed on a C face of a sapphire substrate 11. Regions 13 are located within an angle of ± 10° from a reference plane that tilts at an angle of 43.2° from the C face in a direction of an axis (a) of the sapphire substrate 11. The regions 13 occupy an area of 5% or more of a surface area of the tiny salience 12. The gallium nitride crystals are grown on the sapphire substrate 10. |
申请公布号 |
JP2014034481(A) |
申请公布日期 |
2014.02.24 |
申请号 |
JP20120175077 |
申请日期 |
2012.08.07 |
申请人 |
HITACHI METALS LTD |
发明人 |
FUJIKURA TSUNEAKI;KONNO TAIICHIRO |
分类号 |
C30B29/38;C23C16/34;C30B25/18;H01L21/3065 |
主分类号 |
C30B29/38 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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