发明名称 SAPPHIRE SUBSTRATE FOR GROWING GALLIUM NITRIDE CRYSTAL, MANUFACTURING METHOD OF GALLIUM NITRIDE CRYSTAL, AND GALLIUM NITRIDE CRYSTAL
摘要 PROBLEM TO BE SOLVED: To provide a sapphire substrate for growing gallium nitride crystals that achieves lower dislocation of gallium nitride crystals and higher quality of the gallium nitride crystals compared with a conventional one, a manufacturing method of gallium nitride crystals, and the gallium nitride crystals.SOLUTION: A sapphire substrate 10 for growing gallium nitride crystals has a plurality of tiny saliences 12 formed on a C face of a sapphire substrate 11. Regions 13 are located within an angle of ± 10° from a reference plane that tilts at an angle of 43.2° from the C face in a direction of an axis (a) of the sapphire substrate 11. The regions 13 occupy an area of 5% or more of a surface area of the tiny salience 12. The gallium nitride crystals are grown on the sapphire substrate 10.
申请公布号 JP2014034481(A) 申请公布日期 2014.02.24
申请号 JP20120175077 申请日期 2012.08.07
申请人 HITACHI METALS LTD 发明人 FUJIKURA TSUNEAKI;KONNO TAIICHIRO
分类号 C30B29/38;C23C16/34;C30B25/18;H01L21/3065 主分类号 C30B29/38
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