| 摘要 |
PROBLEM TO BE SOLVED: To suppress deflection or vibration of an exposure mask.SOLUTION: An exposure method includes a step for making the upper surface of a mask M having a mask pattern face the lower surface of a mask air guide 40, a step for making the mask air guide 40 suspension support the mask M in non-contact manner, a step for making a mask holding device 60 hold the mask M suspension supported by the mask air guide 40, and a step for transferring the mask pattern to a substrate by moving the mask M in the scanning direction of illumination light for exposure, and driving an exposed object, i.e., a substrate, in the scanning direction of illumination light for exposure. |
