| 摘要 |
PROBLEM TO BE SOLVED: To provide a cleaning method of a microwave processor which prevents processing container contamination caused by particles or the likes.SOLUTION: A microwave processor device 10 includes: a chamber 11 which houses a workpiece; a microwave introduction mechanism 12 which introduces microwaves into the chamber 11; and a gas introduction mechanism 14 which introduces a gas into the chamber 11. In the microwave processor device 10, a dummy wafer Wd is carried into the chamber 11 and a nitrogen gas is introduced into the chamber 11. The microwaves are introduced into the chamber 11 and the dummy wafer Wd is carried out from the chamber 11. A series of process, which is composed of carrying the dummy wafer Wd into the chamber 11, introducing the nitrogen gas, introducing the microwaves, and carrying the dummy wafer Wd out from the chamber 11, is repeated. |
