| 发明名称 |
MONOMER, POLYMERIC COMPOUND, RESIST COMPOSITION AND PATTERN FORMING METHOD |
| 摘要 |
PROBLEM TO BE SOLVED: To provide a resist composition giving high dissolution contrast and preventing swelling in a developing solution.SOLUTION: A monomer expressed by the formula below is provided; and a polymer is provided, comprising monomers including the monomer. |
| 申请公布号 |
JP2014034667(A) |
申请公布日期 |
2014.02.24 |
| 申请号 |
JP20120177800 |
申请日期 |
2012.08.10 |
| 申请人 |
SHIN ETSU CHEM CO LTD |
发明人 |
SAGEHASHI MASAYOSHI;HATAKEYAMA JUN;HASEGAWA KOJI |
| 分类号 |
C08F220/18;G03F7/038;G03F7/039;G03F7/32;H01L21/027 |
主分类号 |
C08F220/18 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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