发明名称 GLASS SUBSTRATE WITH Ti FILM AND GLASS SUBSTRATE WITH METAL FILM USING THE SAME, PRODUCTION METHOD OF GLASS SUBSTRATE WITH Ti FILM AND GLASS SUBSTRATE WITH METAL FILM USING THE SAME, AND FLATNESS DEGREE EVALUATION METHOD OF GLASS SUBSTRATE SURFACE
摘要 PROBLEM TO BE SOLVED: To provide a glass substrate with a Ti film in which, when a metal film is accumulated on the glass substrate through the Ti film, growth of a hillock associated with heat treatment hardly occurs.SOLUTION: A glass substrate 1 with a Ti film includes: a glass substrate 2 in which the Ti film containing Ti as a main component and having a thickness of 10-100 nm is formed on a surface, and a half value width of a Ti(002) peak measured by an X-ray diffraction of the Ti film using a rocking curve method when an X ray is irradiated to the Ti film is at most 8°; and the Ti film 3 formed by sputtering on the glass substrate 2.
申请公布号 JP2014034479(A) 申请公布日期 2014.02.24
申请号 JP20120174896 申请日期 2012.08.07
申请人 ASAHI GLASS CO LTD 发明人 ISEMURA TSUGUHIDE;MATSUNAGA MASAYA;SERA YOICHI;SUZUKI SUSUMU
分类号 C03C17/40;C03C19/00;C03C23/00;C22C9/00;C22C9/01;C22C9/05;C22C9/06;C22C9/10;C23C14/14 主分类号 C03C17/40
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