| 摘要 |
PURPOSE: A photosensitive polymer is provided to improve uniformity of a photo acid generator and to improve line roughness by including a photoacid generator with an introduced vinyl group into an alicyclic ring. CONSTITUTION: A photosensitive polymer is represented by chemical formula 2. In chemical formula 2, A is C3-40 monocyclic or polycyclic hydrocarbon; B is a (meth)acrylic group; T is an organic counter ion; each of R1, R2, R3, and R4 is independently a hydrogen atom or a C1-40 alkyl group which includes ether group, ester group, carbonyl radical, acetal group, epoxy group, nitrile group, or aldehyde group or not; R5 is independently a hydrogen atom or methyl group; l, m, n, o, and p is mole number of a repeating unit in a main chain; l + m + n + o + p = 1; l, m, n, and o is 0-0.99; and p is 0.01-0.1. |
