| 摘要 |
<p>The present invention relates to a substrate treatment system and more specifically, to a substrate transfer module used in a substrate treatment system for performing a substrate treatment in a state that a mask adheres to a substrate. The substrate transfer module used in a substrate treatment system for performing a substrate treatment in a state that a mask adheres to a substrate comprises a vacuum chamber having a first gate and at least one or more second gates formed to be opposite to each other and internal space separated from the outside therein; a pair of transferred object support parts which are installed in the vacuum chamber to directly or indirectly support a mask when introducing or discharging the mask to or from the vacuum chamber through the second gate; a substrate support assembly which is installed in the vacuum chamber to support the substrate introduced through the first gate; a mask support part which is installed in the vacuum chamber to support and move the mask up and down; and an aligner part for aligning the substrate and the mask by relative movement between the mask supported by the mask support part and the substrate supported by the substrate support assembly, wherein the substrate support assembly includes a plurality of lift pins which are installed to be moved up and down by penetrating the mask up and down and a linear driving part for linearly driving the lift pins up and down. [Reference numerals] (AA) Substrate transfer direction</p> |
