| 摘要 |
The present invention relates to a patterning method of a graphene film, and the method comprises the following steps for instance: binding a first substrate which is coated with graphene with a second substrate with a patterned adhesive layer by locating the graphene and the patterned adhesive layer on the first and second substrates to face each other; and separating the first and second substrates. The first and second substrates are processed with plasma for offering high adhesive force to improve the quality of a pattern. A patterning method of graphene is capable of obtaining a substrate in which two graphene are coated through one cycle of a graphene patterning process, and needs no additional etching process or post-treatment process for reducing the processing time and costs. |
