| 摘要 |
PROBLEM TO BE SOLVED: To provide an imprint system and an imprint method, capable of detecting whether a pattern defect occurred in a template mold-release step.SOLUTION: An imprint system according to an embodiment comprises: a coating unit which coats a photo-curable material on a substrate; a holding unit which holds a template in which an uneven pattern is formed and moves in a vertical direction; a light irradiation unit which cures the photo-curable material by irradiating it with light in a state in which the uneven pattern of the template is in contact with the photo-curable material; an imaging unit which images the template and the photo-curable material when mold-releasing the template from the cured photo-curable material; a calculation unit which calculates a first evaluation value of a contact region between the template and the photo-curable material using the image generated by the imaging unit, and calculates a second evaluation value for mold-release operation using the first evaluation value; and a determination unit which determines whether a pattern defect occurred in the cured photo-curable material on the basis of the second evaluation value. |
