| 摘要 |
PURPOSE: A shower head assembly and a chemical vapor deposition apparatus for having the same are provided to constantly maintain the amount of a process gas sprayed by arranging gas supplying parts at regular intervals. CONSTITUTION: A first head has a first spraying part. A second head (840) has a second spraying part. The second head is laminated on the first head. The first and the second spraying part inject process gases. Gas supplying parts (880) supply the process gases to the first or the second head. |
