| 摘要 |
PURPOSE: A chemical vapor deposition apparatus for a flat panel display is provided to use a sealing lift unit to control deflection of a gas distribution plate which is generated during a manufacturing process even in a vacuum state, thereby reducing initial setting hours. CONSTITUTION: A chemical vapor deposition apparatus for a flat panel display includes a gas distribution plate(31), a backing plate(32), and a sealing lift unit(50). The gas distribution plate is arranged inside a chamber(10), and has multiple passing holes which provide the surface of a glass substrate with a deposition substance. The backing plate is formed with a buffer space(B) which is separated from the gas distribution plate, and is arranged in parallel with the gas distribution plate on the upper area of the gas distribution. The sealing lift unit connects the gas distribution plate and the backing plate on the central area of the gas distribution plate, and prevents the center of the gas distribution from being deflected. The sealing lift unit is combined with the backing plate so that the vacuum state of the buffer space can be separated from the atmosphere state of the upper part of the backing plate. |
