| 摘要 |
PROBLEM TO BE SOLVED: To suppress deterioration of accuracy of a device caused by vibration of a laser interferometer.SOLUTION: An electric charge particle beam lithography device includes a movable stage supporting a sample, and a laser interferometer for measuring a relative distance with respect to the stage in a movement direction of the stage by a laser beam. The laser interferometer includes a polarization beam splitter 12c being an example of an optical component to which a laser beam comes, a vibration absorption material 12h provided on the polarization beam splitter 12c and absorbing vibration, and a weight 12i mounted on the polarization beam splitter 12c. |
