| 摘要 |
PROBLEM TO BE SOLVED: To provide, in a charged particle beam exposure device, an electrode unit for an electrostatic lens capable of reducing the impact of electrode deflection while decreasing electric field strength at a cathode triple point.SOLUTION: A first electrode 101 and a second electrode 102 are arranged across a space 103, and a support member 104 made of a dielectric is arranged between the first electrode 101 and the second electrode 102. The support member 104 has a first region 104a and a second region 104b, and includes, within the second region 104b, a low-dielectric constant portion 105 having a relative dielectric constant lower than that of the first region 104a. |
