HOT ROLLING PROCESS FOR HIGH-PERFORMANCE TANTALUM TARGET

摘要

Provided is a hot rolling process for a high-performance tantalum target. The method comprises: preheating first a forged blank to 900-1,200 °C; then rolling; and performing acid cleaning till tantalum metal luster occurs without mottles. A high-performance tantalum target which comprises uniform and consistent texture components with textures along the thickness direction (110) of the target predominant and meets the use requirements of a high-end sputtering base can be obtained by using a high-performance tantalum target rolling blank produced by heating and rolling. Compared with an ordinary tantalum target, the high-performance tantalum target not only achieves texture components with textures along the thickness direction (110) of the target predominant, but also meets higher requirements on the uniformity of the textures, and therefore a consistent sputtering rate during using is ensured.