发明名称 SELF-ALIGNED THIN FILM TRANSISTOR WITH DOPING BARRIER AND MANUFACTURING METHOD THEREOF
摘要 <p>The present invention relates to a self-aligned thin film transistor with a doping barrier for controlling the diffusion level of a doping barrier using the doping barrier in a thin film transistor having a self-alignment structure and a manufacturing method thereof. A self-aligned thin film transistor with a doping barrier includes an active layer formed on a substrate and having a first doping region, a second doping region and a channel region, a gate insulating layer formed on the channel region, a gate electrode formed on the gate insulating layer, a doping source layer formed on the first and the second doping region, a doping barrier formed between the doping source and the first and the second doping region.</p>
申请公布号 KR20140021096(A) 申请公布日期 2014.02.20
申请号 KR20120086234 申请日期 2012.08.07
申请人 ELECTRONICS AND TELECOMMUNICATIONS RESEARCH INSTITUTE 发明人 HWANG, CHI SUN;PARK, SANG HEE;OH, HIM CHAN
分类号 H01L29/786;H01L21/336 主分类号 H01L29/786
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