发明名称 DEVICE FOR OBJECTIVE MEASUREMENT OF REFRACTIVE WAVEFRONT ABERRATION
摘要 PROBLEM TO BE SOLVED: To provide a device for objective measurement of refractive wavefront aberration in a smaller size at lower costs.SOLUTION: A device for objective measurement of refractive wavefront aberration comprises: an illumination optical system that has a light source 101 and irradiates the fundus of a subject eye 150 with illumination light; a wavefront measurement system having a Hartmann plate 122 that divides reflective luminous flux reflected from the fundus of a subject eye 150 into a plurality of luminous flux, and a first light receiving part 122 for receiving luminous flux divided by the Hartmann plate 121; an anterior eye illumination system for illuminating an anterior eye part of the subject eye 150; an anterior eye observation system having a second light receiving part 114 for receiving light reflected from the anterior eye part of the subject eye 150 that is illuminated by the anterior eye illumination system; and an image data output part 115 for outputting image data of an anterior eye image obtained by the anterior eye observation system. When the light source 101 is set in a range from -3D to -13D, a position of the fungus of the subject eye 150 is set to be substantially conjugate with the light source and a position of the exit pupil is set to be away from an image surface position.
申请公布号 JP2014030573(A) 申请公布日期 2014.02.20
申请号 JP20120172592 申请日期 2012.08.03
申请人 TOPCON CORP 发明人 MIHASHI TOSHIBUMI;TATARA YOKO;SAIGA MAKOTO;ISHINABE IKUO;YOSHIDA KEISUKE;JAMES WOLFFSOHN
分类号 A61B3/10 主分类号 A61B3/10
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