发明名称 |
IMMUNITY ANALYSIS METHOD AND IMMUNITY ANALYSIS DEVICE |
摘要 |
PROBLEM TO BE SOLVED: To provide a high-sensitivity immunity analysis method and an analysis device.SOLUTION: There are provided an immunity analysis method and an analysis device which are configured to subject a component to be measured and an acquisition component singularly reacting therewith to reaction so that when the component to be measured is further present, a reactant is marked, to arrange the marked reactant at a spatially separated predetermined position, and to analyze the component to be measured with sensitivity and resolution of one molecule by detecting the mark of the marked reactant. |
申请公布号 |
JP2014032101(A) |
申请公布日期 |
2014.02.20 |
申请号 |
JP20120172483 |
申请日期 |
2012.08.03 |
申请人 |
HITACHI HIGH-TECHNOLOGIES CORP |
发明人 |
IMAI KYOKO;SAITO TOSHIRO;IMAI KAZUNARI |
分类号 |
G01N33/543;G01N21/64;G01N33/552;G01N33/553;G01N37/00 |
主分类号 |
G01N33/543 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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