发明名称 |
DISPOSABLE CARBON-BASED TEMPLATE LAYER FOR FORMATION OF BORDERLESS CONTACT STRUCTURES |
摘要 |
After formation of gate stacks, a carbon-based template layer is deposited over the gate stacks, and is optionally planarized to provide a planar top surface. A hard mask layer and a photoresist layer are subsequently formed above the carbon-based template layer. A pattern including openings is formed within the photoresist layer. The pattern is subsequently transferred through the hard mask layer and the carbon-based template layer with high selectivity to gate spacers to form self-aligned cavities within the carbon-based template layer. Contact structures are formed within the carbon-based template layer by a damascene method. The hard mask layer and the carbon-based template layer are subsequently removed selective to the contact structures. The contact structures can be formed as contact bar structures or contact via structures. Optionally, a contact-level dielectric layer can be subsequently deposited. |
申请公布号 |
US2014051239(A1) |
申请公布日期 |
2014.02.20 |
申请号 |
US201213585337 |
申请日期 |
2012.08.14 |
申请人 |
BREYTA GREGORY;CHANG JOSEPHINE B.;ENGELMANN SEBASTIAN U.;GUILLORN MICHAEL A.;KLAUS DAVID P.;PYZYNA ADAM M.;INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
BREYTA GREGORY;CHANG JOSEPHINE B.;ENGELMANN SEBASTIAN U.;GUILLORN MICHAEL A.;KLAUS DAVID P.;PYZYNA ADAM M. |
分类号 |
H01L21/28 |
主分类号 |
H01L21/28 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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