| 发明名称 |
NANOIMPRINT LITHOGRAPHY MASK AND MANUFACTURING METHOD THEREOF |
| 摘要 |
PROBLEM TO BE SOLVED: To provide a nanoimprint lithography mask capable of detecting a defective part with high sensitivity.SOLUTION: The above-described problem is solved by providing a nanoimprint lithography mask that includes a design defective portion that is formed intentionally. |
| 申请公布号 |
JP2014033173(A) |
申请公布日期 |
2014.02.20 |
| 申请号 |
JP20120265638 |
申请日期 |
2012.12.04 |
| 申请人 |
DAINIPPON PRINTING CO LTD |
发明人 |
NISHIGUCHI TAKAO;SASAKI SHIHO;HIROTA REIJI;YOSHIKAWA SHINGO |
| 分类号 |
H01L21/027;B29C59/16 |
主分类号 |
H01L21/027 |
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