发明名称 PLASMA GENERATION DEVICE, CVD DEVICE AND PLASMA TREATMENT PARTICLE GENERATION DIVICE
摘要 <p>The present invention provides a plasma generation apparatus that, even when a source gas is supplied into a housing where an electrode cell is arranged, does not cause a problem of corrosion of a power feed part and an electrode surface arranged in the housing and a problem of deposition of a metal in a place within the housing other than a discharge part of the electrode cell. A plasma generation apparatus (100) according to the present invention includes an electrode cell and a housing (16) that encloses the electrode cell. The electrode cell includes a first electrode (3), a second electrode (1) facing the first electrode (3) with interposition of a discharge space (6) therebetween, and dielectrics (2a, 2b) arranged on main surfaces of the electrodes (1, 3). The plasma generation apparatus (100) further includes a pipe passage (75) configured to directly supply a source gas from the outside of the housing (16) to the discharge space (6) without being connected to a space within the housing (16) where the electrode cell is not arranged.</p>
申请公布号 KR20140021712(A) 申请公布日期 2014.02.20
申请号 KR20147000877 申请日期 2012.04.23
申请人 TOSHIBA MITSUBISHI-ELECTRIC INDUSTRIAL SYSTEMS CORPORATION 发明人 TABATA YOICHIRO;WATANABE KENSUKE
分类号 H05H1/24;C23C16/452;C23C16/505;H01L21/31 主分类号 H05H1/24
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