| 摘要 |
PROBLEM TO BE SOLVED: To provide a synthetic quartz glass excellent in permeability of helium gas and a method for producing the same to solve a problem of a bad influence on a fine pattern due to unevenness of a mold resulting from a stria and a high production cost in a TiO-SiOglass.SOLUTION: A method for producing a synthetic quartz glass for nanoimprinting mold in which a flame hydrolysis of a silicon source material by an oxyhydrogen flame is carried out and a silica microparticle formed is deposited on a rotating quartz glass target and melted into a molten glass to form a synthetic quartz glass ingot, which is molded, annealed and dehydrogenated at a temperature of 600°C or more, for a retention time of 12 hours or more and at a pressure of 5 Pa or less. The present invention provides a synthetic quartz glass for nanoimprinting mold superior in permeability of helium gas. |
